Advances in thin film thermocouple durability under high temperature and pressure testing conditions /

Advances in thin film thermocouple durability under high temperature and pressure testing conditions /

Bibliographic Details
Main Author: Martin, Lisa C.
Corporate Author: Lewis Research Center
Other Authors: Fralick, Gustave C., Taylor, Keith F.
Format: Government Document Book
Language:English
Published: [Cleveland, Ohio] : National Aeronautics and Space Administration, Lewis Research Center ; [1999]
Series:NASA technical memorandum ; 208812.
Subjects:
Thermocouples.
Thin films.
Photolithography.
Durability.

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Call Number: NAS 1.15:208812
 
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NAS 1.15:208812 Available