Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /

Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /

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Bibliographic Details
Other Authors: Rossnagel, Stephen M., Cuomo, J. J., Westwood, William D. (William Dickson), 1937-
Format: Book
Language:English
Published: Park Ridge, N.J., U.S.A. : Noyes Publications, [1990]
Series:Materials science and process technology series.
Subjects:
Plasma engineering.
Semiconductors > Etching.
Plasma etching.

Evans: Library Stacks

Holdings details from Evans: Library Stacks
Call Number: TA2020 .H37 1990
 
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TA2020 .H37 1990 Available