Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, SPIE Symposium on Microlithography
Other Authors:	Yanof, Arnold W.
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1989]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1089.
Subjects:	Lithography, Electron beam > Congresses. X-ray lithography > Congresses. Ion beam lithography > Congresses.