Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California /

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California /

Bibliographic Details
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Resnick, Douglas J.
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1990]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 1263.
Subjects:
Lithography, Electron beam > Congresses.
X-ray lithography > Congresses.
Ion beam lithography > Congresses.

Remote Storage

Holdings details from Remote Storage
Call Number: TK7874 .E483 1990
 
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TK7874 .E483 1990 Available