Plasma etching : fundamentals and applications /

Plasma etching : fundamentals and applications /

Bibliographic Details
Main Author: Sugawara, M. (Minoru)
Other Authors: Stansfield, Barry L.
Format: Book
Language:English
Published: Oxford ; New York : Oxford University Press, 1998.
Series:Series on semiconductor science and technology ; 7.
Subjects:
Semiconductors > Etching.
Plasma etching.

Evans: Library Stacks

Holdings details from Evans: Library Stacks
Call Number: TK7871.85 .S88 1998
 
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TK7871.85 .S88 1998 Available