Chemical vapor deposition modeling for high temperature materials : prepared for 1991 Hall meeting of the Materials Research Society, Boston, Massachusetts, December 2-6, 1991 /

Chemical vapor deposition modeling for high temperature materials : prepared for 1991 Hall meeting of the Materials Research Society, Boston, Massachusetts, December 2-6, 1991 /

Bibliographic Details
Main Author: Gökoǧlu, Süleyman A.
Corporate Author: United States. National Aeronautics and Space Administration
Format: Government Document Book
Language:English
Published: [Washington, DC] : [National Aeronautics and Space Administration] ; [1997]
Series:NASA technical memorandum ; 105386.
Subjects:
Coating.
Reaction kinetics.
Refractory materials.
Thermochemistry.
Vapor deposition.
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