Plasma processes for semiconductor fabrication /

Plasma processes for semiconductor fabrication /

Bibliographic Details
Main Author: Hitchon, W. Nicholas G.
Format: Book
Language:English
Published: Cambridge ; New York : Cambridge University Press, 1999.
Series:Cambridge studies in semiconductor physics and microelectronic engineering ; 8.
Subjects:
Semiconductors > Etching.
Plasma etching.

Evans: Library Stacks

Holdings details from Evans: Library Stacks
Call Number: TK7871.85 .H54 1999
 
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TK7871.85 .H54 1999 Available