The pain behind the mask : overcoming masculine depression /

Bibliographic Details
Main Author: Lynch, John, 1950-
Other Authors: Kilmartin, Christopher
Format: Book
Language:English
Published: New York : Haworth Press, [1999]
Series:Advances in psychology and mental health.
Subjects:

MARC

LEADER 00000cam a2200000 a 4500
001 in00001488894
005 20151021071118.0
008 980915s1999 nyua b 001 0 eng
010 |a  98045944  
020 |a 0789005573 (hardcover : alk. paper) 
020 |a 0789005581 (pbk. :alk. paper) 
035 |a (OCoLC)39951766 
035 |9 AJH1472AM 
040 |a DLC  |c DLC  |d YDX  |d TXA  |d UtOrBLW 
049 |a TXAM 
050 0 0 |a RC537  |b .L94 1999 
082 0 0 |a 616.85/27/0081  |2 21 
100 1 |a Lynch, John,  |d 1950- 
245 1 4 |a The pain behind the mask :  |b overcoming masculine depression /  |c John Lynch, Christopher Kilmartin. 
264 1 |a New York :  |b Haworth Press,  |c [1999] 
264 4 |c ©1999 
300 |a xviii, 210 pages :  |b illustrations ;  |c 22 cm. 
336 |a text  |b txt  |2 rdacontent 
337 |a unmediated  |b n  |2 rdamedia 
338 |a volume  |b nc  |2 rdacarrier 
490 1 |a Advances in psychology and mental health 
504 |a Includes bibliographical references (pages 201-206) and index. 
650 0 |a Depression, Mental. 
650 0 |a Men  |x Mental health. 
650 0 |a Men  |x Psychology. 
700 1 |a Kilmartin, Christopher. 
830 0 |a Advances in psychology and mental health. 
948 |a c:jh 
999 |a MARS 
999 f f |s b8b78ef0-1fb5-34db-b855-1a375ce5deb3  |i 073ec574-9d78-34b6-9a07-a66d0783437b  |t 0 
952 f f |p ric  |a Texas A&M University  |b Rellis Campus  |c Joint Library Facility  |d Remote Storage  |t 0  |e RC537 .L94 1999  |h Library of Congress classification  |i unmediated -- volume  |m A14824993793 
998 f f |a RC537 .L94 1999  |t 0  |l Remote Storage