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|a TA1540
|b .O74 2002
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| 245 |
0 |
0 |
|a Organic photorefractive and photosensitive materials for holographic applications :
|b 9 July 2002, Seattle, Washington, USA /
|c Klaus Meerholz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, the Boeing Company.
|
| 264 |
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1 |
|a Bellingham, Washington :
|b SPIE,
|c [2002]
|
| 264 |
|
4 |
|c ©2002
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| 300 |
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|a v, 156 pages :
|b illustrations ;
|c 28 cm.
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| 336 |
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|a text
|b txt
|2 rdacontent
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| 337 |
|
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|a unmediated
|b n
|2 rdamedia
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| 338 |
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|a volume
|b nc
|2 rdacarrier
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| 490 |
1 |
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|a Proceedings / SPIE--the international society for optical engineering ;
|v v. 4802
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| 504 |
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|a Includes bibliographical references and index.
|
| 650 |
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0 |
|a Holography
|x Materials
|v Congresses.
|
| 650 |
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0 |
|a Photorefractive materials
|v Congresses.
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| 650 |
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0 |
|a Optical materials
|v Congresses.
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| 700 |
1 |
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|a Meerholz, Klaus.
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| 710 |
2 |
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|a Society of Photo-optical Instrumentation Engineers.
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| 710 |
2 |
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|a Boeing Company.
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| 830 |
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0 |
|a Proceedings of SPIE--the International Society for Optical Engineering ;
|v v. 4802.
|
| 948 |
|
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|a cataloged
|b h
|c 2002/12/19
|d c
|e dmitchel
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|a Texas A&M University
|b Rellis Campus
|c Joint Library Facility
|d Remote Storage
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|i unmediated -- volume
|m A14829602290
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