A study on reactive ion etching of barium strontium titanate films using mixtures of argon (Ar), carbon tetrafluoride (CF4), and sulfur hexafluoride (SF6) /

Bibliographic Details
Main Author:	Hirsch, Samuel G. (Author)
Format:	Government Document eBook
Language:	English
Published:	Aberdeen Proving Ground, MD : Army Research Laboratory, July 2014.
Series:	ARL-TR (Aberdeen Proving Ground, Md.) ; 6979.
Subjects:	Semiconductors > Etching. Varactors.
Online Access:	https://purl.fdlp.gov/GPO/gpo61146 http://purl.fdlp.gov/GPO/gpo61146