|
|
|
|
| LEADER |
00000cam a2200000Mi 4500 |
| 001 |
in00004639599 |
| 006 |
m o d |
| 007 |
cr bn||||m|||a |
| 008 |
200128m20209999wau ob 001 0 eng d |
| 005 |
20230110224412.9 |
| 035 |
|
|
|a (OCoLC)on1139258396
|
| 040 |
|
|
|a SPIES
|b eng
|e rda
|c SPIES
|d OCLCO
|d UIU
|d UPM
|d OCL
|d OCLCQ
|d ZCU
|d OCL
|d OCLCO
|
| 020 |
|
|
|a 9781510631564
|q (v. 1 ;
|q pdf)
|
| 020 |
|
|
|a 1510631569
|q (v. 1 ;
|q pdf)
|
| 020 |
|
|
|a 9781510631571
|q (v. 1 ;
|q epub)
|
| 020 |
|
|
|a 1510631577
|q (v. 1 ;
|q epub)
|
| 020 |
|
|
|a 9781510631588
|q (v. 1 ;
|q kindle edition)
|
| 020 |
|
|
|a 1510631585
|q (v. 1 ;
|q kindle edition)
|
| 020 |
|
|
|z 9781510631557
|q (v. 1 ;
|q paperback)
|
| 020 |
|
|
|z 1510631550
|q (v. 1 ;
|q paperback)
|
| 024 |
7 |
|
|a 10.1117/3.2551242
|2 doi
|
| 035 |
|
|
|a (OCoLC)1139258396
|
| 050 |
|
4 |
|a TP156.E68
|b O44 2020eb
|
| 082 |
0 |
4 |
|a 686.2/315
|2 23
|
| 049 |
|
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|a TXAM
|
| 100 |
1 |
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|a Okoroanyanwu, Uzodinma,
|e author.
|
| 245 |
1 |
4 |
|a The chemical history of lithography /
|c Uzodinma Okoroanyanwu.
|
| 250 |
|
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|a Second edition.
|
| 264 |
|
1 |
|a Bellingham, Washington (1000 20th St. Bellingham WA 98225-6705 USA) :
|b SPIE,
|c 2020.
|
| 300 |
|
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|a 1 online resource (274 pages)
|
| 336 |
|
|
|a text
|b txt
|2 rdacontent
|
| 337 |
|
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|a computer
|b c
|2 rdamedia
|
| 338 |
|
|
|a online resource
|b cr
|2 rdacarrier
|
| 490 |
1 |
|
|a SPIE Press monograph ;
|v PM313
|
| 490 |
1 |
|
|a Chemistry and lithography, Second edition ;
|v Vol. 1
|
| 504 |
|
|
|a Includes bibliographical references and index.
|
| 505 |
0 |
|
|a General preface to the second edition -- Acronyms and abbreviations -- 1. Introduction to lithography -- 2. Invention of lithography and photolithography: 2.1. Introduction; 2.2. Invention of lithography; 2.3. Invention of photolithography; 2.4. Pioneers of photolithography -- 3. Physical origins of lithography: 3.1. Introduction; 3.2. Key developments in optical physics that enabled the invention and development of lithography; 3.3. Key developments in optical instruments and glassmaking technologies that enabled the development of lithography; 3.4. Key developments in atomic and molecular physics that enabled the invention and development of lithography -- 4. Chemical origins of lithography: 4.1. Introduction; 4.2. Key developments in chemistry that enabled the invention and development of lithography; 4.3. Laws and theories of chemical reactions; 4.4. Rational synthesis of chemical substances; 4.5. The structure of chemical compounds and phenomena deriving from them -- 5. Evolution of lithography: 5.1. Introduction; 5.2. Offset lithography; 5.3. The printed circuit board and the development of the electronics industry; 5.4. The transistor and microelectronics revolution; 5.5. Semiconductor lithography; 5.6. Advanced lithographic patterning techniques and imaging mechanisms; 5.7. Outlook on the evolution of lithography -- Index.
|
| 520 |
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|a "This volume is the first in a series of three books that make up the second edition of Chemistry and Lithography, which is continued in volume 2 (Chemistry in Lithography) and volume 3 (The Practice of Lithography). Each volume is a unit in itself and can stand alone, which is fortunate in view of their different subject matters. Volume 1 of the present edition weaves together threads of a narrative on the history of optical and molecular physics, optical technology, chemistry, and lithography, with a view to creating a rich tapestry that gives the reader new insights into an aspect of the relationships between these fields that are often not fully appreciated: how the marriage between chemistry and optics led to the development and evolution of lithography. We show how major developments in chemistry, physics and technology of light influenced the invention and development of lithography, well beyond what its inventor envisioned. We also show how developments in lithography have not only influenced the development of optics and chemistry, but also played a critical role in the large scale manufacture of integrated circuits that run the computers and machineries on which our modern electronic and information age depend. Part of the analysis in this volume is necessarily skewed towards the underlying science and technologies of advanced lithographic patterning techniques, in terms of materials, processes, imaging, along with their unique features, strengths and limitations. This book also provides an analysis of the emerging trends in lithographic patterning, along with the current and potential applications of the resulting patterned structures and surfaces"--
|c Provided by publisher
|
| 500 |
|
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|a Title from PDF title page (SPIE eBooks Website, viewed 2020-01-28).
|
| 650 |
|
0 |
|a Lithography.
|
| 650 |
|
0 |
|a Chemistry, Technical.
|
| 650 |
|
0 |
|a Semiconductors
|x Etching.
|
| 650 |
|
6 |
|a Lithographie.
|
| 650 |
|
6 |
|a Chimie industrielle.
|
| 650 |
|
6 |
|a Semi-conducteurs
|x Attaque chimique.
|
| 650 |
|
7 |
|a lithography.
|2 aat
|
| 650 |
|
7 |
|a Lithography.
|2 fast
|0 (OCoLC)fst01000265
|
| 650 |
|
7 |
|a Chemistry, Technical.
|2 fast
|0 (OCoLC)fst00853546
|
| 650 |
|
7 |
|a Semiconductors
|x Etching.
|2 fast
|0 (OCoLC)fst01112219
|
| 655 |
|
7 |
|a Electronic books.
|2 local
|
| 710 |
2 |
|
|a Knovel (Firm)
|
| 710 |
2 |
|
|a Society of Photo-optical Instrumentation Engineers,
|e publisher.
|
| 776 |
0 |
8 |
|i Print version:
|z 1510631550
|z 9781510631557
|w (DLC) 2019037747
|
| 830 |
|
0 |
|a SPIE Press monograph ;
|v PM313.
|
| 856 |
4 |
0 |
|u http://proxy.library.tamu.edu/login?url=https://app.knovel.com/hotlink/toc/id:kpCLVTCHL1/chemistry-and-lithography?kpromoter=marc
|z Connect to the full text of this electronic book
|t 0
|
| 955 |
|
|
|a Knovel ebooks
|
| 994 |
|
|
|a 92
|b TXA
|
| 999 |
f |
f |
|s 317bbd9e-cafb-48bf-ae24-ea5ab5f415e3
|i 99d38e81-ba3a-4130-bbc2-42979a4873cc
|t 0
|
| 952 |
f |
f |
|a Texas A&M University
|b College Station
|c Electronic Resources
|d Available Online
|t 0
|e TP156.E68 O44 2020eb
|h Library of Congress classification
|
| 998 |
f |
f |
|a TP156.E68 O44 2020eb
|t 0
|l Available Online
|