Photoelasticity ; proceedings of the international symposium held at Illinois Institute of Technology /

Photoelasticity ; proceedings of the international symposium held at Illinois Institute of Technology /

Bibliographic Details
Corporate Authors: International Symposium on Photoelasticity Chicago, Illinois Institute of Technology, United States. Army Research Office--Durham, N.C
Other Authors: Frocht, Max Mark, 1894-1974
Format: Conference Proceeding Book
Language:English
Published: New York : Macmillan, 1963.
Subjects:
Photoelasticity > Congresses.

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Call Number: TA406 .I5 1961a
 
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TA406 .I5 1961a Available