X-ray lithography and applications of soft X-rays to technology : October 19-20, 1983, Upton, New York : [proceedings] /

X-ray lithography and applications of soft X-rays to technology : October 19-20, 1983, Upton, New York : [proceedings] /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, National Synchrotron Light Source (Organization : U.S.)
Other Authors: Wilson, Alan D.
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE--the International Society for Optical Engineers, [1984]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 448.
Subjects:
X-rays > Congresses.
Online Access:https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0448.toc?SSO=1

Internet

https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0448.toc?SSO=1

Remote Storage

Holdings details from Remote Storage
Call Number: QC480.8 .X72 1983
 
Call Number Status Get It
QC480.8 .X72 1983 Available