Electron-beam, x-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California /

Electron-beam, x-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California /

Bibliographic Details
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Blais, Phillip D.
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1987]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 773.
Subjects:
Lithography, Electron beam > Congresses.
X-ray lithography > Congresses.
Ion beam lithography > Congresses.

Remote Storage

Holdings details from Remote Storage
Call Number: TK7874 .E483 1987
 
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TK7874 .E483 1987 Available