Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, SEMATECH (Organization), North Carolina State University. Center for Advanced Electronic Materials Processing, University of Wisconsin--Madison. Engineering Research Center for Plasma-Aided Manufacturing
Other Authors:	Bondur, James, Reinberg, Alan R.
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1990]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1185.
Subjects:	Semiconductors > Congresses. Microelectronics > Congresses. Microlithography > Congresses. Photolithography > Congresses.