Resists in microlithography and printing /

Resists in microlithography and printing /

Bibliographic Details
Main Author: Bednář, B.
Other Authors: Králíček, Jaroslav, Zachoval, Jaromír
Format: Book
Language:English
Published: Amsterdam ; New York : Elsevier, 1993.
Edition:2nd rev. ed.
Series:Materials science monographs ; 76.
Subjects:
Semiconductors > Design and construction.
Integrated circuits > Very large scale integration > Design and construction.
Microlithography.
X-ray lithography.
Lithography, Electron beam.

Evans: Library Stacks

Holdings details from Evans: Library Stacks
Call Number: TK7871.85 .B375313 1993
 
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TK7871.85 .B375313 1993 Available