Patterning of material layers in submicron region /

Patterning of material layers in submicron region /

Bibliographic Details
Main Author: Tandon, U. S., 1952-
Other Authors: Khokle, W. S.
Format: Book
Language:English
Published: New York : J. Wiley, 1993.
Subjects:
Integrated circuits > Masks.
Ion beam lithography.
Lithography, Electron beam.
X-ray lithography.
Integrated circuits > Production > Use of > Lithography

Evans: Library Stacks

Holdings details from Evans: Library Stacks
Call Number: TK7872.M3 P38 1993
 
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TK7872.M3 P38 1993 Available